...King Wai Chiu Lai; Jeffri J. Narendra; Ning Xi; Jiangbo Zhang; Timothy A. Grotjohn; Jes Asmussen Plasma processing is an important technology, which provides a capability to modify the material surface through etching, deposition, activation, functionalization, polymerization, etc. In the current...

...Jack Zhou; Guoliang Yang There are three major steps toward the fabrication of a single-digit nanohole: (1) preparing the free-standing thin film by epitaxial deposition and electrochemical etching, (2) making submicron holes ( 0.2 – 0.02 μ m ) by focused ion beam (FIB), and (3) reducing the hole...

... of residual stress measurement are very time consuming and expensive. In this paper we presents a wet etching approach to obtain strain as a function of slot depth introduced in the subsurface. The strain readings were collected from a strain gauge mounted on the specimen surface near the slot edge...

... is being etched. Etching in KOH and HF is conducted to verify corrosion characteristics of oxide. Schuster , R. , and Kirchner , V. , 2000 , “ Electrochemical Micromachining ,” Science , 289 , pp. 98 – 101 . Park , J. W. , Lee , E. S. , and Moon , Y. H. , 2002...

... of thin surface layers affected by manufacturing processes. The so-called white etching layer (WL) produced in steel surfaces by machining and abrasion is characterized. The WL is found to have a hardness in the range of 11.5–16.2 GPa, which is significantly greater than that of untempered martensite...

...Herman C. J. Bruneel The paper studies the intrinsic errors on strain measurements induced by the application of an electrochemical etched square grid through serigraphy. Systematic periodic strains are observed when the etched grid is directly measured before any mechanical deformation...