Plasma processing is an important technology, which provides a capability to modify the material surface through etching, deposition, activation, functionalization, polymerization, etc. In the current plasma process, the reactive area of the sample is relatively large and thus a mask is needed for selectively treating the sample surface. As a result, the whole fabrication process has become more complicated. In this paper, a plasma integrated nanomanufacturing workcell, which consists of a microplasma source and an integrated atomic force microscopy (AFM) probe tip, has been developed to improve the current plasma apparatus design. The miniature microwave plasma discharge applicator is capable of creating a miniature plasma stream with a diameter ranging from 2 mm down to micrometers. Hence, with the new plasma apparatus it has become possible to locally treat a small area of the sample surface and simplify the fabrication process as the photomask is not required. Additionally, the AFM active probe can be precisely positioned on a desired surface to inspect and manipulate nanoobjects. Here, we report the design and implementation of this new system. Experimental results demonstrate the effectiveness of the system and show that the microplasma can be used in various applications including localized etching of silicon and diamond and localized patterning of photoresist.
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e-mail: kinglai@egr.msu.edu
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June 2010
Research Papers
Development of Plasma Nanomanufacturing Workcell
King Wai Chiu Lai,
King Wai Chiu Lai
Department of Electrical and Computer Engineering,
e-mail: kinglai@egr.msu.edu
Michigan State University
, East Lansing, MI 48824
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Jeffri J. Narendra,
Jeffri J. Narendra
Department of Electrical and Computer Engineering,
Michigan State University
, East Lansing, MI 48824
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Ning Xi,
Ning Xi
Department of Electrical and Computer Engineering,
Michigan State University
, East Lansing, MI 48824
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Jiangbo Zhang,
Jiangbo Zhang
Department of Electrical and Computer Engineering,
Michigan State University
, East Lansing, MI 48824
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Timothy A. Grotjohn,
Timothy A. Grotjohn
Department of Electrical and Computer Engineering,
Michigan State University
, East Lansing, MI 48824
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Jes Asmussen
Jes Asmussen
Department of Electrical and Computer Engineering,
Michigan State University
, East Lansing, MI 48824
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King Wai Chiu Lai
Department of Electrical and Computer Engineering,
Michigan State University
, East Lansing, MI 48824e-mail: kinglai@egr.msu.edu
Jeffri J. Narendra
Department of Electrical and Computer Engineering,
Michigan State University
, East Lansing, MI 48824
Ning Xi
Department of Electrical and Computer Engineering,
Michigan State University
, East Lansing, MI 48824
Jiangbo Zhang
Department of Electrical and Computer Engineering,
Michigan State University
, East Lansing, MI 48824
Timothy A. Grotjohn
Department of Electrical and Computer Engineering,
Michigan State University
, East Lansing, MI 48824
Jes Asmussen
Department of Electrical and Computer Engineering,
Michigan State University
, East Lansing, MI 48824J. Manuf. Sci. Eng. Jun 2010, 132(3): 031003 (8 pages)
Published Online: April 29, 2010
Article history
Received:
June 16, 2009
Online:
April 29, 2010
Revised:
May 4, 2010
Published:
June 16, 2010
Citation
Lai, K. W. C., Narendra, J. J., Xi, N., Zhang, J., Grotjohn, T. A., and Asmussen, J. (April 29, 2010). "Development of Plasma Nanomanufacturing Workcell." ASME. J. Manuf. Sci. Eng. June 2010; 132(3): 031003. https://doi.org/10.1115/1.4001719
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