The TNL (Tribo Nanolithography) method in aqueous solution uses the atomic force microscopy as a machining tool for the nanoscale fabrication of silicon. A specially designed cantilever with a diamond tip allows the formation of oxide patterns easily by a simple scratching process. A rectangular structure with a slope can be fabricated by a process in which a thin oxide layer rapidly forms in the substrate at the diamond-tip sample junction along the scanning path of the tip, and, simultaneously, the area uncovered with the oxide layer is being etched. Etching in KOH and HF is conducted to verify corrosion characteristics of oxide.

Issue Section:
Technical Papers
Keywords:
silicon, micromachining, nanolithography, atomic force microscopy, etching, tribology, oxidation, corrosion resistance, pattern formation, elemental semiconductors
Topics:
Atomic force microscopy, Diamonds, Etching, Nanolithography, Silicon, Cantilevers, Corrosion resistance
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