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research-article

Connecting Microstructures for Multiscale Topology Optimization with Connectivity Index Constraints

[+] Author and Article Information
Zongliang Du

Structural Engineering Department, University of California San Diego, San Diego, CA 92093, USA
zodu@eng.ucsd.edu

Xiao-Yi Zhou

School of Engineering, Cardiff University, Cardiff, CF24 3AA, UK
zhoux19@cf.ac.uk

Renato Picelli

School of Engineering, Cardiff University, Cardiff, CF24 3AA, UK
picellir@cf.ac.uk

Hyunsun Alicia Kim

Structural Engineering Department, University of California, San Diego, San Diego, CA 92093, USA, School of Engineering, Cardiff University, Cardiff, CF24 3AA, United Kingdom
alicia@ucsd.edu

1Corresponding author.

ASME doi:10.1115/1.4041176 History: Received April 01, 2018; Revised August 06, 2018

Abstract

With the rapid developments of advanced manufacturing and its ability to manufacture microscale features, architected materials are receiving ever increasing attention in many physics fields. Such a design problem can be treated in topology optimization as architected material with repeated unit cells using the homogenization theory with the periodic boundary condition. When multiple architected materials with spatial variations in a structure are considered, a challenge arises in topological solutions which may not be connected between adjacent material architecture. This paper introduces a new measure, Connectivity Index (CI) to quantify the topological connectivity and adds it as a constraint in multiscale topology optimization to achieve connected architected materials. Numerical investigations reveal that the additional constraints lead to microstructural topologies which are well connected and do not substantially compromise their optimalities.

Copyright (c) 2018 by ASME
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